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Summary
Manufactured through various processes including chemical synthesis, surface treatment, and ultrafine classification.
Feature
High purity, narrow particle size distribution, high sphericity, and excellent fluidity; superior dielectric performance, low thermal expansion coefficient, and small specific surface area, make it particularly suitable for M6 grade and above high-frequency, high-speed copper-clad laminates; monodisperse uniform particle that are more easily bonded with resin after surface treatment.
Function
High-speed and high-frequency copper-clad laminate, liquid encapsulant material, BT substrate, IC substrate, and BF material.
| SE Series | ||||
| Typical Physical Data | Test Item | Unit | Typical Value | Test Method |
| D50 | μm | 0.3~6.5 | Laser PSA | |
| D99 | μm | 0.7~12 | ||
| Spheroidization Rate | % | 100 | SEM | |
| tanδ | —— | 0.00022~0.0009 | Paraffin Compression Method | |
| CTE | ppm/℃ | 0.5 | Theoretical Value | |
| Typical Chemical Data | SiO2 | % | 99.9 | XRF |
Summary
Manufactured through various processes including chemical synthesis, surface treatment, and ultrafine classification.
Feature
High purity, narrow particle size distribution, high sphericity, and excellent fluidity; superior dielectric performance, low thermal expansion coefficient, and small specific surface area, make it particularly suitable for M6 grade and above high-frequency, high-speed copper-clad laminates; monodisperse uniform particle that are more easily bonded with resin after surface treatment.
Function
High-speed and high-frequency copper-clad laminate, liquid encapsulant material, BT substrate, IC substrate, and BF material.
| SE Series | ||||
| Typical Physical Data | Test Item | Unit | Typical Value | Test Method |
| D50 | μm | 0.3~6.5 | Laser PSA | |
| D99 | μm | 0.7~12 | ||
| Spheroidization Rate | % | 100 | SEM | |
| tanδ | —— | 0.00022~0.0009 | Paraffin Compression Method | |
| CTE | ppm/℃ | 0.5 | Theoretical Value | |
| Typical Chemical Data | SiO2 | % | 99.9 | XRF |